奈米微影科技導論

The objective of this course is to let students learn the fundamental knowledge of nano-lithography. There will be materials for students to understand the current trend and know-how of the advanced optical lithography equipment or materials. In this course, we will describe the things that drive the limits of optical lithography and study optical imaging from the perspective of diffraction, and the advanced development of the new lithography technology. The goal is to develop a fundamental understanding of concepts of diffraction, Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, image enhancement, and automatic micro-imaging measurement.

Optics, electromagnetics, Semiconductor Device

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midterm 30%, homework 30%, final 40% (group presentation 20% and final report 20%)

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Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki Suzuki, Bruce Smith

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