表面分析技術

In this course, we will introduce techniques for surface analysis and the physical mechanism, including scanning electron microscopy (SEM), Auger electron microscopy, X-ray photoelectron spectroscopy (XPS or ESCA), ultra-violet photoelectron spectroscopy (UPS), secondary ion mass spectroscopy (SIMS), ion scattering spectroscopy, vacuum technology, scanning probe microscopy (STM, AFM, etc.), low energy electron diffraction (LEED), and reflection high-energy electron diffraction (RHEED).

普通物理 (general physics),普通化學(general chemistry)。 Suggested: 量子力學 (quantum mechanics),固態物理 (solid-state physics),半導體物理與製程 (semiconductor physics and manufacturing)

無備註

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The average of the midterm (40%) and the final examinations (45%) will contribute 85% of the final academic score. The rest (15%) depends on your class performance (quits and homework).

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PPT slide presentation in English. Lecture notes will be provided.

地點

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時間

By appointment

聯絡方式

yenlinhuang@nycu.edu.tw